Sputtering target for TFT-LCD
The advantages of TFT-LCD are less energy consumption, high brightness and low response time. TTMC provide high purity and quality of Al, Mo, Cu, Ti targets for TFT-LCD and AM-OLED industries. Meanwhile, we well manage the material resource and improve technology to ensure the product quality and meet customers’ requirement for large size TFT-LCD panel which lead TTMC to high market share of sputtering target industry.。
Application
- Drive Electrode: Al (5N), Al alloy, Cr, Ti, Mo, Cu.
- Black Matrix: Cr
- Transparent Electrode: ITO (In2O3-SnO2)(In2O3-SnO2)
- Diffuser material: Mo, Cr
- Dielectric material: Al2O3 , SiO2
Product Advantages
- Well management of high purity raw material resource and processing,fully in-house and quality control.
- High market share and stable supply for generation 1 to 10.5 TFT-LCD panel
- High strength special bonding metal.
- Planar and rotary sputtering target synchronized supply.
Glass substrate size and sputtering target
| Gen | Glass substrate size (mm) | Target size(mm) |
| G3.5 | 610x720; 620x750 | 890x980 |
| G4 | 680x880 | 980x1150 |
| G5 | 1100x1300 | 1431x1700 |
| G5.5 | 1300x1500 | 1580x1950 |
| G6 | 1500x1850 |
200x2300 8 segments |
| G7.5 | 1950x2250 |
180x2650 12 segments |
| G8.5 | 2200x2500 |
185x2650 14 segments |
| G10 | 2880x3130 |
238x3400 16 segments |
| G10.5 | 2940x3370 |
300x3430 16 segments |
Main Products
Display/Touch Thin Film Targets, Optical Data Storage Media Targets, High Frequency/Passive Component Thin Film Target Materials, Tool/Coating Thin Film Targets, Semiconductor Targets and Evaporation Materials, Sputtering Equipment Components, Aluminum-Based Composite Materials, Pure Titanium and Ti
Related Products
Contact Detail
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AddressNo.1, Luke 8th Rd., Lujhu District, Kaohsiung, Taiwan R.O.C.
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Tel+886-7-6955125
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Fax+886-7-6955205
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E-mail
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URL